PROCEDES ET SYSTEME PERMETTANT D'EMPECHER LA FORMATION DE DEFAUT EN LITHOGRAPHIE PAR IMMERSION

摘要

An immersion lithography system includes an immersion fluid holder for containing an immersion fluid. The system further includes a stage for positioning a resist-coated semiconductor wafer in the immersion fluid holder and a lens proximate to the immersion fluid holder and positionable for projecting an image through the immersion fluid and onto the resist-coated semiconductor wafer. The immersion fluid holder includes a coating configured to reduce contaminate adhesion from contaminates in the immersion fluid.