发明名称 Electron beam sensitive mixture resist
摘要 This invention describes an ionizing radiation sensitive material having high contrast, high sensitivity and comprised of the mixture of the half-ester or half amide product of reaction of an N-hydroxy or N-aminoalkyl amide with an alkylvinyl ether-maleic anhydride copolymer and the products of reaction of a hydroxy alkyl terminally unsaturated compound with an alkylvinyl ether-maleic anhydride copolymer. A typical material is made by mixing the product of reaction of hydroxyethyl pyrrolidone and octadecylvinyl ether-maleic anhydride copolymer with the products of reaction of the mixture of hydroxyethyl acrylate with octadecylvinyl ether-maleic anhydride copolymer.
申请公布号 US4448875(A) 申请公布日期 1984.05.15
申请号 US19830480636 申请日期 1983.03.31
申请人 GAF CORPORATION 发明人 LEWIS, DAVID F.
分类号 G03F7/004;G03F7/038;(IPC1-7):G03C5/16 主分类号 G03F7/004
代理机构 代理人
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