发明名称 |
PHOTORESISTS COMPRISING IONIC COMPOUND |
摘要 |
Provided is a novel photoresist composition including radiation-non sensitive ionic compounds. The desirable photoresist of the present invention may include: a resin including a photoacid-unstable group; a photoacid generator compound; and a radiation-non sensitive ionic compound which can function to reduce the spread of photoacid from the non-exposure area of a photoresist coating layer. |
申请公布号 |
KR20140056098(A) |
申请公布日期 |
2014.05.09 |
申请号 |
KR20130130549 |
申请日期 |
2013.10.30 |
申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. |
发明人 |
POHLERS GERHARD;LIU CONG;XU CHENG BAI;WU CHUNYI |
分类号 |
G03F7/039;G03F7/038;G03F7/26;H01L21/027 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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