发明名称 PRIMER, PRODUCTION METHOD OF PATTERNED CURED FILM, PATTERNED CURED FILM AND SEMICONDUCTOR ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a primer with which a patterned cured film can be formed with good adhesiveness not only to a silicon substrate but to a wiring material such as copper and gold.SOLUTION: The primer is used for forming a photosensitive layer comprising a photosensitive resin composition which comprises an alkali-soluble resin including a phenolic hydroxyl group on a substrate; and the primer comprises a triazine compound having a mercapto group, and a solvent.
申请公布号 JP2014102285(A) 申请公布日期 2014.06.05
申请号 JP20120252434 申请日期 2012.11.16
申请人 HITACHI CHEMICAL CO LTD 发明人 MATSUTANI HIROSHI;NOBE SHIGERU;KASUYA KEI;OKADA YUHEI;AOKI MASARU;KATOGI SHIGEKI;ABE KOICHI;TANIMOTO AKITOSHI;YAMAMOTO MASAHARU;TAHARA SHINGO
分类号 G03F7/11;G03F7/004;G03F7/023 主分类号 G03F7/11
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