发明名称 LIQUID PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a clean gas supply mechanism which can extend a filter nearer on an upstream side than a blower even when the blower is normally operated.SOLUTION: A clean gas supply mechanism 30 supplying a processing chamber 10 of a liquid processing apparatus with clean gas has a supply path 32 which has an air inlet at an upstream end and whose downstream end is connected to a processing chamber. The supply path 32 is provided with: a blower 34; a filter 36 provided nearer an upstream side than the blower; and a return path 38 which branches from the supply path at a first position 32a nearer the downstream side than the blower and nearer the upstream side than the processing chamber and is connected to the supply path at a second part 32b nearer on the downstream side than the filter and nearer on the upstream side than the blower. There is provided a switch mechanism 40 for selectively switching a first state that the clean gas transmitted from the blower to the downstream side and a second state that the clean gas transmitted from the blower to the downstream side is returned to the supply path via a return path.
申请公布号 JP2014236081(A) 申请公布日期 2014.12.15
申请号 JP20130116043 申请日期 2013.05.31
申请人 TOKYO ELECTRON LTD 发明人 NAKAMURA TORU
分类号 H01L21/304;F24F7/06;H01L21/306 主分类号 H01L21/304
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