PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD OF CURED FILM, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE, AND ORGANIC ELECTROLUMINESCENCE (EL) DISPLAY DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive resin composition that suppresses a bottom residue of a contact hole, suppresses surface roughening after development and shows excellent chemical resistance.SOLUTION: The photosensitive resin composition comprises: (A-1) (1) a polymer having a structural unit (a1-1) having a group in which an acid group is protected by an acid decomposable group and a structural unit (a1-2) having a crosslinking group; (B-1) a photoacid generator; and (C-1) a solvent. Otherwise, the photosensitive resin composition comprises: (A-2) a polymer having a structural unit (a2-1) having an acid group and a structural unit (a2-2) having a crosslinking group; (Q-2) a naphthoquinone compound; and (C-2) a solvent. In the above photosensitive resins, (S-1) a compound having a skeleton expressed by general formula (S) is compounded.