| 摘要 |
The present invention provides a TiO2-SiO2 glass having suitable thermal expansion properties as an optical member of an exposure tool for EUVL. The present invention relates to a TiO2-containing silica glass having a TiO2 content of from 3 to 9 % by mass; a temperature, at which a coefficient of thermal expansion is 0 ppb/°C, falling within the range of from 15 to 35°C; a fictive temperature of 850 °C or lower; and a temperature width, in which a coefficient of thermal expansion is 0 ± 5 ppb/°C, of 7.8 °C or greater. |
