| 摘要 |
PROBLEM TO BE SOLVED: To provide a high-accuracy patterning method for an electroless nickel alloy film. SOLUTION: The patterning method for an electroless nickel alloy film includes a step of using a surface-modifying solution and a step of using an etching liquid. Firstly, the electroless nickel alloy film is deposited on a substrate and then, a resist pattern is formed on the alloy film by photolithography, and the exposed surface of the alloy film where the resist pattern is formed is immersed in the surface-modifying solution to be modified. Subsequently, the modified surface of the alloy film is immersed in the etching liquid, and finally the resist pattern is removed. The etching liquid to be used here is adjusted so as to have an oxidation power stronger than the surface-modifying solution. COPYRIGHT: (C)2012,JPO&INPIT |
