RESIST STRIPPING SOLUTION AND RESIST STRIPPING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a resist stripping solution and a resist stripping method by which a thermally reactive resist essentially comprising copper oxide can be stripped with a high throughput without leaving a residual film.SOLUTION: The resist stripping solution is to be used for a thermally reactive resist essentially comprising copper oxide, and has a pH of lower than 0. The resist stripping solution contains at least sulfuric acid. A fine pattern is imparted to the resist film which is composed of the thermally reactive resist and to be stripped by the resist stripping solution.