SLURRY, POLISHING LIQUID SET, POLISHING LIQUID, AND METHOD FOR POLISHING SUBSTRATE BY USING THE SLURRY, THE SET, AND THE LIQUID

摘要

PROBLEM TO BE SOLVED: To provide a polishing liquid set which can exhibit an additional effect of an additive and by which a film to be polished can be polished at an excellent polishing rate, and to provide a polishing liquid.SOLUTION: A slurry polishing liquid contains an abrasive grain, the additive and water. The abrasive grain includes tetravalent cerium hydroxide particles. The aqueous dispersion, the abrasive grain content of which is adjusted to 1.0 mass%, exhibits 50%/cm or higher light transmittance to the light of 500 nm wavelength. Further, the slurry polishing liquid contains a dispersant such as a polyvinyl alcohol polymer, and has the pH of 2.0-9.0.