| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an acrylic acid ester derivative which is useful as the raw material for a polymer compound for a photoresist composition having excellent lithographic properties and improved LWR and forms a photoresist pattern of high resolution. <P>SOLUTION: The acrylic acid ester derivative is represented by general formula (1) (wherein, R<SP POS="POST">1</SP>denotes a hydrogen atom, a methyl group or a trifluoromethyl group; R<SP POS="POST">4</SP>and R<SP POS="POST">6</SP>denote respectively independent groups, or both the R<SP POS="POST">4</SP>and R<SP POS="POST">6</SP>are coupled to show a 1 to 3C alkylene group, -O- or -S-; and R<SP POS="POST">11</SP>denotes a hydrogen atom, a 1C to 6C alkyl group or a 3C to 10C cyclic hydrocarbon group). <P>COPYRIGHT: (C)2013,JPO&INPIT |
