发明名称 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a nonvolatile semiconductor memory device that includes a transistor having low resistance of a gate electrode.SOLUTION: A nonvolatile semiconductor memory device includes a semiconductor substrate and a memory cell transistor capable of writing and erasing of electrical data. The nonvolatile semiconductor memory device further includes a memory cell unit having the memory cell transistor and a first selection gate transistor connected to one end of the memory cell transistor. A gate electrode of the memory cell transistor includes a stack of a floating gate electrode being electrically floated and a control gate electrode. A gate electrode of the first selection gate transistor has a lower electrode being electrically floated and an upper electrode. The gate electrode of the first selection gate transistor has a side-wall electrode on its side-wall portion that faces the upper electrode, the lower electrode, and the semiconductor substrate via an insulating film.
申请公布号 JP2015015347(A) 申请公布日期 2015.01.22
申请号 JP20130140735 申请日期 2013.07.04
申请人 TOSHIBA CORP 发明人 TAKEKIDA HIDEHITO;MIKASA NORIAKI
分类号 H01L21/8247;H01L21/336;H01L27/10;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/8247
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