发明名称 |
NONVOLATILE SEMICONDUCTOR MEMORY DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a nonvolatile semiconductor memory device that includes a transistor having low resistance of a gate electrode.SOLUTION: A nonvolatile semiconductor memory device includes a semiconductor substrate and a memory cell transistor capable of writing and erasing of electrical data. The nonvolatile semiconductor memory device further includes a memory cell unit having the memory cell transistor and a first selection gate transistor connected to one end of the memory cell transistor. A gate electrode of the memory cell transistor includes a stack of a floating gate electrode being electrically floated and a control gate electrode. A gate electrode of the first selection gate transistor has a lower electrode being electrically floated and an upper electrode. The gate electrode of the first selection gate transistor has a side-wall electrode on its side-wall portion that faces the upper electrode, the lower electrode, and the semiconductor substrate via an insulating film. |
申请公布号 |
JP2015015347(A) |
申请公布日期 |
2015.01.22 |
申请号 |
JP20130140735 |
申请日期 |
2013.07.04 |
申请人 |
TOSHIBA CORP |
发明人 |
TAKEKIDA HIDEHITO;MIKASA NORIAKI |
分类号 |
H01L21/8247;H01L21/336;H01L27/10;H01L27/115;H01L29/788;H01L29/792 |
主分类号 |
H01L21/8247 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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