UV-ASSISTED REMOVAL OF METAL OXIDES IN AN AMMONIA-CONTAINING ATMOSPHERE

摘要

A method for removing copper oxides from a substrate with one or more copper features is disclosed herein. The method can include positioning a substrate comprising one or more copper and dielectric containing structures in a processing chamber delivering a cleaning gas comprising ammonia to the processing chamber; and exposing the copper and dielectric containing structure to the cleaning gas and ultraviolet (UV) radiation concurrently.