COBALT SUBSTRATE PROCESSING SYSTEMS, APPARATUS, AND METHODS

摘要

Electronic device processing systems including cobalt deposition are described. One system includes a mainframe having a transfer chamber and at least two facets, and one or more process chambers adapted to carry out a metal or metal oxide removal process and possibly an annealing processes on substrates, and one or more deposition process chambers adapted to carry out a cobalt deposition process. Other systems includes a transfer chamber, one or more load lock process chambers coupled to the transfer chamber that are adapted to carry out a metal or metal oxide removal process. Additional methods and systems for cobalt deposition processing of substrates are described, as are numerous other aspects.