VAPOR DEPOSITION MASK, VAPOR DEPOSITION MASK MANUFACTURING METHOD, AND ORGANIC SEMICONDUCTOR ELEMENT MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a vapor mask capable of realizing both of high precision and a light weight even when the mask is made large, and forming high-precision vapor deposition patterns while keeping strength, a vapor deposition mask manufacturing method capable of simply manufacturing the vapor deposition mask, and an organic semiconductor element manufacturing method capable of manufacturing a high-precision organic semiconductor element.SOLUTION: On a vapor deposition mask 100 for forming vapor deposition patterns of plural screens at the same time, a metallic mask 10 with plural slits 15 and a resin mask 20 are laminated. An opening 25 required for constituting the plural screens is provided on the resin mask 20. The opening 25 corresponds to a pattern formed by vapor deposition, and each slit 15 is provided at a position overlaid entirely on at least one screen. A metallic protrusion part 40 is provided on the resin mask 20 corresponding to a position overlaid on the slit 15.