发明名称 |
AUTO-FOCUS SYSTEM AND METHODS FOR DIE-TO-DIE INSPECTION |
摘要 |
Disclosed are methods and apparatus for detecting defects in a semiconductor sample having a plurality of identically designed areas. An inspection tool is used to construct an initial focus trajectory for a first swath of the sample. The inspection tool is then used to scan the first swath by following the initial focus trajectory for the first swath while collecting autofocus data. A z offset measurement vector for each identically designed area in the first swath is generated based on the autofocus data. A corrected z offset vector is constructed for inspection of the first swath with the inspection tool. Constructing the corrected z offset vector is based on combining the z offset measurement vectors for two or more of the identically designed areas in the first swath so that the corrected z offset vector specifies a same z offset for each set of same positions in the two or more identically designed areas. |
申请公布号 |
US2015029499(A1) |
申请公布日期 |
2015.01.29 |
申请号 |
US201414336875 |
申请日期 |
2014.07.21 |
申请人 |
KLA-Tencor Corporation |
发明人 |
Wright Michael J.;Lin Zhengcheng;Ghonsalves Wilfred L.;Belin Daniel L.;Sousa Weston L. |
分类号 |
G01N21/88;G01N21/956;G01N21/95 |
主分类号 |
G01N21/88 |
代理机构 |
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代理人 |
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主权项 |
1. A method for detecting defects in a semiconductor sample having a plurality of identically designed areas, the method comprising:
using an inspection tool to construct an initial focus trajectory for a first swath of the sample; using the inspection tool to scan the first swath by following the initial focus trajectory for the first swath while collecting autofocus data; generating a z offset measurement vector for each identically designed area in the first swath based on the autofocus data; and constructing a corrected z offset vector for inspection of the first swath with the inspection tool, wherein constructing the corrected z offset vector is based on combining the z offset measurement vectors for two or more of the identically designed areas in the first swath so that the corrected z offset vector specifies a same z offset for each set of same positions in the two or more identically designed areas. |
地址 |
Milpitas CA US |