| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma processing apparatus and a method capable of stably igniting plasma to directly exposing high temperature portion of thermal plasma to a base material with a simple structure.SOLUTION: The plasma processing apparatus has plural rollers 13 as a base material loading part for holding a base material 1 facing an inductively-coupled plasma torch unit T. When the base material holder 12 and the base material 1 placed thereon pass through between the inductively-coupled plasma torch unit T and an opposite rotating member 14, the plasma processing is made. Prior to this, in a state that the inductively-coupled plasma torch unit T is faced to the opposite rotating member, the plasma is stably ignited. |
