发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition and a photosensitive element having good adhesiveness and resolution and giving a flexible photosensitive layer after exposure, and to provide a method for forming a resist pattern and a method for manufacturing a printed wiring board using the photosensitive resin composition or the photosensitive element.SOLUTION: The photosensitive resin composition comprises (A) a binder polymer, (B) a photopolymerizable compound having an ethylenically unsaturated bond, and (C) a photopolymerization initiator. The (A) component comprises (a1) 55 to 75 mass% of a structural unit derived from a benzyl (meth)acrylate derivative, (a2) 5 to 15 mass% of a structural unit derived from a styrene derivative, and (a3) 10 to 30 mass% of a structural unit derived from a (meth)acrylic acid.
申请公布号 JP2015018029(A) 申请公布日期 2015.01.29
申请号 JP20130143493 申请日期 2013.07.09
申请人 HITACHI CHEMICAL CO LTD 发明人 KUBOTA MASAO
分类号 G03F7/033;C08F2/00;C08F2/44;C08F2/48;C08F220/18;C08K5/3445;C08L33/10;G03F7/004;G03F7/029;G03F7/031;H05K3/06;H05K3/18 主分类号 G03F7/033
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