| 摘要 |
<p>In order to reliably detect hole patterns and carry out pattern measurement even under the influence of noise, distortion, and surrounding patterns in an image in which concentrated patterns having a regular arrangement are imaged, an image of patterns on a substrate is imaged, pattern arrangement detection processing is carried out in which the regular arrangement of the patterns within an image area is detected, template matching is carried out in which the positions of the patterns within the image area are detected, the position of each pattern is detected through the integration of the results of the pattern arrangement detection and the template matching, measurement cursors are set, and pattern dimension measurement processing is carried out for each measurement cursor.</p> |
