发明名称 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM
摘要 A substrate processing unit 14 includes processing modules 2 each performing a process on a substrate, and a substrate transfer device 121 is provided between a mounting unit 11 and the processing modules. A parameter storage unit 3 stores sets of transfer parameter 33 where an operating speed of the substrate transfer device corresponds to a processing number of substrates per a unit time. A parameter selecting unit 4 compares a processing number of substrates per a unit time determined based on a recipe 31 corresponding to the process, with those corresponding to the transfer parameters and selects a transfer parameter corresponding to the minimum processing number of substrates among the processing numbers of substrates equal to or larger than that determined based on the recipe. A transfer control units 151 to 153 control the substrate transfer device based on a set value of the selected transfer parameter.
申请公布号 US2015027638(A1) 申请公布日期 2015.01.29
申请号 US201414338558 申请日期 2014.07.23
申请人 Tokyo Electron Limited 发明人 Kaneko Tomohiro
分类号 H01L21/02 主分类号 H01L21/02
代理机构 代理人
主权项 1. A substrate processing apparatus, comprising: a mounting unit configured to mount thereon substrates to be processed; a substrate processing unit including a plurality of processing modules each configured to perform a process on the substrate; a substrate transfer device provided between the mounting unit and the processing modules; a parameter storage unit configured to store plural sets of transfer parameter in which a set value of an operating speed of the substrate transfer device based on a processing number of substrates in the substrate processing unit corresponds to a processing number of substrates per a unit time in the substrate processing unit; a parameter selecting unit configured to compare a processing number of substrates per a unit time in the substrate processing unit, which is determined based on a recipe corresponding to the process performed on the substrate, with the processing numbers of substrates corresponding to the transfer parameters stored in the parameter storage unit, and configured to select, from the parameter storage unit, a transfer parameter corresponding to the minimum processing number of substrates among the processing numbers of substrates corresponding to the transfer parameters each having the processing number of substrates equal to or larger than the processing number of substrates determined based on the recipe; and a transfer control unit configured to control the substrate transfer device based on a set value of the transfer parameter selected by the parameter selecting unit.
地址 Tokyo JP