发明名称 |
METHOD FOR MANUFACTURING SUBSTRATE FOR ELECTROOPTICAL DEVICE, SUBSTRATE FOR ELECTROOPTICAL DEVICE, ELECTROOPTICAL DEVICE, AND ELECTRONIC EQUIPMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a substrate for an electrooptical device capable of stably forming a groove having a shape suitable for a prism as a light reflection unit.SOLUTION: A method for manufacturing a substrate for an electrooptical device comprises the steps of: forming a mask on a first surface of the substrate (step S1); forming an opening surrounded by a wall surface and including a first width on the mask (step S2); forming a first groove by anisotropically etching the first surface exposed in the opening (steps S3 and S4); removing the mask (step S5); and forming a second groove whose opening has a second width by accumulating a first insulating film covering the inside of the first groove (step S6). The first width is wider than the second width. |
申请公布号 |
JP2015018148(A) |
申请公布日期 |
2015.01.29 |
申请号 |
JP20130146149 |
申请日期 |
2013.07.12 |
申请人 |
SEIKO EPSON CORP |
发明人 |
MIYAWAKI DAISUKE;ITO SATOSHI |
分类号 |
G02F1/1333;G02F1/1335;G09F9/00;H01L21/3065 |
主分类号 |
G02F1/1333 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|