发明名称 METHOD FOR MANUFACTURING SUBSTRATE FOR ELECTROOPTICAL DEVICE, SUBSTRATE FOR ELECTROOPTICAL DEVICE, ELECTROOPTICAL DEVICE, AND ELECTRONIC EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a substrate for an electrooptical device capable of stably forming a groove having a shape suitable for a prism as a light reflection unit.SOLUTION: A method for manufacturing a substrate for an electrooptical device comprises the steps of: forming a mask on a first surface of the substrate (step S1); forming an opening surrounded by a wall surface and including a first width on the mask (step S2); forming a first groove by anisotropically etching the first surface exposed in the opening (steps S3 and S4); removing the mask (step S5); and forming a second groove whose opening has a second width by accumulating a first insulating film covering the inside of the first groove (step S6). The first width is wider than the second width.
申请公布号 JP2015018148(A) 申请公布日期 2015.01.29
申请号 JP20130146149 申请日期 2013.07.12
申请人 SEIKO EPSON CORP 发明人 MIYAWAKI DAISUKE;ITO SATOSHI
分类号 G02F1/1333;G02F1/1335;G09F9/00;H01L21/3065 主分类号 G02F1/1333
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