PROCESS FOR PRODUCING GLASS SUBSTRATE PROVIDED WITH INORGANIC FINE PARTICLE-CONTAINING SILICON OXIDE FILM

摘要

To provide a process for producing a glass substrate provided with an inorganic fine particle-containing silicon oxide film, wherein inorganic fine particles having a desired particle size may be used depending on intended optical properties, and the range of selection of the inorganic fine particles is wide.;A process for producing a glass substrate provided with an inorganic fine particle-containing silicon oxide film, which comprises applying a coating liquid containing inorganic fine particles 14, a hydrolysate of an alkoxysilane, and one of or both water and a (poly)ethylene glycol, to a glass substrate 10 to form an inorganic fine particle-containing silicon oxide film 12; or which comprises forming molten glass into a glass ribbon, annealing the glass ribbon, and at the time of cutting the glass ribbon to obtain a glass substrate, applying a coating liquid containing inorganic fine particles, a hydrolysate of an alkoxysilane, and one of or both water and a (poly)ethylene glycol, to the glass ribbon to form an inorganic fine particle-containing silicon oxide film.

主权项

1. A process for producing a glass substrate provided with an inorganic fine particle-containing silicon oxide film, which comprises applying a coating liquid containing inorganic fine particles, a hydrolysate of an alkoxysilane, and one of or both water and a (poly)ethylene glycol, to a glass substrate to form an inorganic fine particle-containing silicon oxide film.