发明名称 METHOD FOR MANUFACTURING A TEM-LAMELLA AND ASSEMBLY HAVING A TEM-LAMELLA PROTECTIVE STRUCTURE
摘要 A method for manufacturing a TEM-lamella is disclosed. The method includes: disposing a self-supporting protective structure on a surface of a substrate; bonding the protective structure to the substrate; cutting out a lamella from the substrate using a particle beam so that the lamella remains bonded to at least a portion of the protective structure; fastening a first tool to the lamella; and moving away the lamella from a residual portion of the substrate by moving the first tool relative to the substrate.
申请公布号 US2015028225(A1) 申请公布日期 2015.01.29
申请号 US201414337470 申请日期 2014.07.22
申请人 Carl Zeiss Microscopy GmbH 发明人 Lechner Lorenz
分类号 H01J37/20;B32B38/10;B32B38/00 主分类号 H01J37/20
代理机构 代理人
主权项 1. A method, comprising: disposing a self-supporting protective structure on a surface of a substrate; bonding the protective structure to the substrate; cutting out a lamella from the substrate using a particle beam so that the lamella remains bonded to at least a portion of the protective structure; fastening a first tool to the lamella; and moving the first tool relative to the substrate to move the lamella away from a residual portion of the substrate, wherein bonding the protective structure to the substrate comprises a process selected from the group consisting of: forming molecular bonds between the protective structure and the substrate via a process that comprises: directing a particle beam onto at least one member selected from the group consisting of the protective structure and the substrate; and depositing only material dislodged via the particle beam from at least member selected from the group consisting of the protective structure and the substrate; andapplying an adhesive agent to at least one member selected from the group consisting of the protective structure and the substrate; and curing the adhesive agent by directing a beam onto a member selected from the group consisting of the adhesive agent, the substrate in proximity of the adhesive agent, and the protective structure in proximity of the adhesive agent, wherein the beam is selected from the group consisting of a particle beam and a light beam.
地址 Jena DE