| 摘要 |
PROBLEM TO BE SOLVED: To effectively detect marks when marks are provided on a rear surface of a substrate, and to detect a location information of the substrate even when the detection of marks becomes difficult.SOLUTION: A mark detection device 8 for detecting a mark formed on a wafer W, comprises: a wafer transfer device 66 for temporarily holding the wafer W where the mark 46 is formed on its rear surface; a mark detection part 52 for detecting location information of the mark 46 in a state that the wafer W is held on the wafer transfer device 66; a mark formation part for forming an alternative mark on a surface of the wafer W on the basis of the location information of the detected mark 46; a storage part for storing a positional relationship between the mark 46 and the alternative mark; a mark detection part 52 for detecting location information of the alternative mark in a state that the wafer W is held on the wafer transfer device 66; and edge detection parts 53A, 53B. |
