发明名称 PRODUCTION OF THIN MULTI-LAYERED FILM
摘要 PURPOSE:To impart strong adhesive power between layers and to prevent interlayer delamination and interlayer breakdown by forming mixed layers of the respective layers between the layers at the time of forming thin multi- layered films. CONSTITUTION:The thin multi-layered films are formed on a substrate 1 by passing the substrate 1 over plural film forming sources 5-11 in a vacuum chamber 2. The Cr film forming source 6 for the mixed layers, the Co-Ni film forming source 7 for the mixed layers, the Co-Ni film forming source 9 for the mixed layers and the C film forming source 10 for the mixed layers are disposed in addition to the film forming sources 5, 8, 11 for Cr, Co-Ni and C. The distances between the respective film forming sources are set at the distances at which the particles from both the front and rear film forming sources adhere to the substrate at the time when the substrate passes over said film forming sources to form the intermediate mixed layers between the respective layers. As a result, the boundary faces between the respective layers are annihilated and the adhesive layer of the single layer is eventually provided between the two layers, by which the generation of the interlayer delamination and the interlayer breakdown is prevented.
申请公布号 JPS63211121(A) 申请公布日期 1988.09.02
申请号 JP19870042570 申请日期 1987.02.27
申请人 HITACHI LTD 发明人 FUNAMOTO SUSUMU
分类号 G11B5/84;G11B5/85 主分类号 G11B5/84
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