| 摘要 |
PROBLEM TO BE SOLVED: To provide photolithographic processes to produce patterns on magnetic roll surfaces that are not attainable through conventional machining or extrusion.SOLUTION: A photoresist is formed on an exterior of a cylinder, and the photoresist is exposed to a light source while the cylinder is rotated. After the exposure, the photoresist is developed to change the photoresist into a patterned protective layer on the exterior of the cylinder. Then, while the cylinder is rotated, the exterior of the cylinder is patterned using the patterned protective layer to produce a patterned cylinder. |
