| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide methods of depositing tungsten in different sized features on a substrate.SOLUTION: The methods involve depositing a first bulk layer of tungsten in the features, etching the deposited tungsten, depositing a second bulk tungsten, which is interrupted to treat the tungsten after the smaller features are completely filled, and resuming deposition of the second bulk layer after the treatment in order to deposit smaller, smoother tungsten grains into the large features. The methods also involve depositing tungsten in multiple cycles of deposition-etching-deposition, where each cycle targets a group of similarly sized features using an etching agent specific for that group, and depositing in groups from the smallest sized features to the largest sized features. The deposition produces smaller, smoother grains with void-free fill for a wide range of sized features in a substrate.</p> |
