发明名称 |
VACUUM-PROCESSING APPARATUS, VACUUM-PROCESSING METHOD, AND STORAGE MEDIUM |
摘要 |
<p>The present disclosure provides a vacuum-processing apparatus for forming a metal film on a substrate by sputtering targets with ions of plasma, and then oxidizing the metal film, the apparatus including: a first target composed of a material having a property of adsorbing oxygen; a second target composed of a metal; a power supply unit configured to apply a voltage to the targets; a shutter configured to prevent particles generated from one of the targets from adhering to the other of the targets; a shielding member; an oxygen supply unit configured to supply an oxygen-containing gas to the substrate mounted on the mounting unit; and a control unit configured to perform supplying a plasma-generating voltage to the targets and sputtering the targets and supplying the oxygen-containing gas from the oxygen supply unit to the substrate.</p> |
申请公布号 |
KR20150016945(A) |
申请公布日期 |
2015.02.13 |
申请号 |
KR20147032112 |
申请日期 |
2013.04.30 |
申请人 |
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发明人 |
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分类号 |
C23C14/14;C23C14/35;C23C14/58;H01L21/203;H01L43/12 |
主分类号 |
C23C14/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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