发明名称 露光装置
摘要 <P>PROBLEM TO BE SOLVED: To provide an exposure device capable of accurately adjusting the position of a mask with respect to an exposure object member by changing an alignment mark for mask position adjustment corresponding to the meandering of the exposure object member even when the exposure object member is continuously supplied, and capable of highly accurately and stably performing exposure. <P>SOLUTION: An exposure device 1 is provided in which an alignment mark forming part 13 is disposed on the upstream side from an irradiation position of exposure light and an alignment mark 2a in which an intermittent index is applied in the moving direction of an exposure object member 2 is formed. A detection part 14 detects a position in the index position of the alignment mark 2a in the direction crossing the moving direction of the exposure object member 2. Then, a meandering amount of the alignment mark 2a is calculated from the detection results of the detection part 14 to move the alignment mark forming part 13. Alternatively, the position of a mask 12 is adjusted when the detection part 14 is disposed so as to correspond to the irradiation position of exposure light. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP5678334(B2) 申请公布日期 2015.03.04
申请号 JP20100250089 申请日期 2010.11.08
申请人 发明人
分类号 G03F9/00;G02F1/13;G03F7/20 主分类号 G03F9/00
代理机构 代理人
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