发明名称 REFLECTIVE MASK BLANK AND REFLECTIVE MASK
摘要 <p>PROBLEM TO BE SOLVED: To provide an EUV mask, the surface of which is effectively cooled (temperature-regulated) during light exposure, and a mask blank.SOLUTION: In a reflective mask blank, a multilayer reflection layer 2, a protective layer 3, and an absorber layer 4 are sequentially stacked on one surface (front side) of a base plate 1. The reflective mask blank is characterized as follows: heat conduction layers 6t, 6b and 6s are formed on the front and back sides of the base plate 1 and a side surface thereof, respectively; and the heat conduction layers are made of a material including carbon or solid metal.</p>
申请公布号 JP2015053433(A) 申请公布日期 2015.03.19
申请号 JP20130186246 申请日期 2013.09.09
申请人 TOPPAN PRINTING CO LTD 发明人 FUKUGAMI NORIHITO;TANABE MASATO
分类号 H01L21/027;G03F1/24 主分类号 H01L21/027
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