| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma source that ionizes gas and heats plasma using an RF antenna, an applied magnetic field, plasma and a coaxial gas confinement tube, and specifically to provide a technique relating to improvements to antennas, magnet geometries, and thermal solutions for the steady state production and heating of plasma.SOLUTION: A plasma source includes: an RF coupler; an ionization chamber 115 including a flow inlet 119 through which gas enters the chamber, an upstream manifold 118, a reasonably RF transparent gas confinement tube 108 that allows RF power from the RF coupler to couple to plasma inside the chamber, and a flow exit 116 through which plasma exits from the chamber; and a magnetic choke restriction part 117 downstream from the ionization chamber 115. |
