| 摘要 |
PURPOSE:To obtain hardly deformable high purity quartz glass having a prolonged service life by successively subjecting dry silica gel obtd. by a sol-gel process to heat treatment, pulverizing, slurrying and wet molding and by successively subjecting the resulting porous body to heat treatment, sintering and melting in vacuum. CONSTITUTION:Dry silica gel obtd. by a sol-gel process with alkoxysilane as starting material is heat-treated at 1,000-1,300 deg.C and the resulting amorphous silica is dry-pulverized to obtain silica powder. This silica powder is mixed with a solvent and wet-pulverized to prepare slip having <=10mum average particle size and 1-10m<2>/g BET specific surface area. This slip is wet-molded and dried at room temp. to 200 deg.C and the resulting porous body is heat-treated at 1,000-1,300 deg.C, sintered and melted by heating to >=1,600 deg.C in vacuum. |
