发明名称 SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME
摘要 The present invention relates to a salt and a photoresist composition including the salt. Particularly, a salt is represented by chemical formula (I): [Chemical Formula 1] In the chemical formula 1, R^1 and R^2 independently represent a hydrogen atom, a hydroxy group or a C1-C12 hydrocarbon group where a methylene group can be replaced by an oxygen atom or a carbonyl group; Ar represents a C6-C36 aromatic hydrocarbon group which can have a substituent or a C6-C36 heteroaromatic hydrocarbon group which can have a substituent; A^- represents an organic anion; and ″m″ and ″n″ independently each represent an integer of 1 to 2.
申请公布号 KR20150047434(A) 申请公布日期 2015.05.04
申请号 KR20140143539 申请日期 2014.10.22
申请人 SUMITOMO CHEMICAL CO., LTD. 发明人 ANRYU YUKAKO;ICHIKAWA KOJI;YASUE TAKAHIRO
分类号 C07D339/08;G03F7/004 主分类号 C07D339/08
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