发明名称 |
SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME |
摘要 |
The present invention relates to a salt and a photoresist composition including the salt. Particularly, a salt is represented by chemical formula (I): [Chemical Formula 1] In the chemical formula 1, R^1 and R^2 independently represent a hydrogen atom, a hydroxy group or a C1-C12 hydrocarbon group where a methylene group can be replaced by an oxygen atom or a carbonyl group; Ar represents a C6-C36 aromatic hydrocarbon group which can have a substituent or a C6-C36 heteroaromatic hydrocarbon group which can have a substituent; A^- represents an organic anion; and ″m″ and ″n″ independently each represent an integer of 1 to 2. |
申请公布号 |
KR20150047434(A) |
申请公布日期 |
2015.05.04 |
申请号 |
KR20140143539 |
申请日期 |
2014.10.22 |
申请人 |
SUMITOMO CHEMICAL CO., LTD. |
发明人 |
ANRYU YUKAKO;ICHIKAWA KOJI;YASUE TAKAHIRO |
分类号 |
C07D339/08;G03F7/004 |
主分类号 |
C07D339/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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