发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD OF CURED FILM, CURED FILM, ORGANIC ELECTROLUMINESCENCE (EL) DISPLAY DEVICE, AND LIQUID CRYSTAL DISPLAY DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having a sufficiently wide margin of exposure luminous energy in a halftone exposure part while maintaining good sensitivity, a method for forming a cured film, a cured film, an organic EL display device, and a liquid crystal display device.SOLUTION: The photosensitive resin composition comprises (A) a polymer component including a polymer satisfying at least one of the following (1) and (2), (B) a photoacid generator, (C) a benzophenone compound having absorption at 365 nm, and (D) a solvent. (1) A polymer having (a1) a structural unit having a group in which an acid group is protected by an acid decomposable group and (a2) a structural unit having a crosslinking group. (2) A polymer having (a1) a structural unit having a group in which an acid group is protected by an acid decomposable group, and a polymer having (a2) a structural unit having a crosslinking group.
申请公布号 JP2015099320(A) 申请公布日期 2015.05.28
申请号 JP20130239999 申请日期 2013.11.20
申请人 FUJIFILM CORP 发明人 SHIMOYAMA TATSUYA
分类号 G03F7/039;G02F1/1333;G03F7/004;G03F7/40;H01L21/027;H01L51/50;H05B33/22 主分类号 G03F7/039
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