| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a nozzle plate manufacturing method having high reliability. <P>SOLUTION: The nozzle plate manufacturing method 100 includes a step of forming a nozzle hole 20 that penetrates from a first surface 13 of a silicon substrate 10 to a second surface 14 thereof on the silicon substrate 10; a step of forming a coating film on the first surface 13 and on a third surface 16 of the silicon substrate 10 connected to the first surface 13 and the second surface 14; a step of dividing the first surface 13 into a first region 11 and a second region 12 enclosing the first region 11, by covering a first region 11 containing the nozzle hole 20 of the first surface 13 with the coating film formed thereon with a mask member in plan view; a step of performing etching while using a mask member as a mask, and of removing at least a portion of the coating film formed on the second region 12 and the coating film formed on the third surface 16; and a step of forming a silicon oxide film 34 on the third surface 16 in which an oxygen plasma ashing is performed and at least the coating film is removed therefrom. <P>COPYRIGHT: (C)2013,JPO&INPIT</p> |
