发明名称 SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE AND MANUFACTURING METHOD OF THE SAME
摘要 PROBLEM TO BE SOLVED: To achieve a fast operation of an eDRAM.SOLUTION: An eDRAM comprises: a selection MISFET (TR1) having a gate electrode G1 which becomes a word line WL, a source region SR1 and a drain region DR1; a source plug electrode PLGS connected to the source region SR1; and a drain plug electrode PLGD connected to the drain region DR1. The eDRAM further has: a capacitive plug electrode PLGC connected to the drain plug electrode PLGD; a bit line BL connected to the source plug electrode PLGS; a stopper film STP1 which covers the bit line BL; and a capacitive element CON which is formed on the stopper film STP1 and has a first electrode EL1, a dielectric film CINS and a second electrode EL2. The first electrode EL1 is connected with the capacitive plug electrode PLGC and a height of the capacitive plug electrode PLGC is equal to a height of the bit line BL.
申请公布号 JP2015103708(A) 申请公布日期 2015.06.04
申请号 JP20130244224 申请日期 2013.11.26
申请人 RENESAS ELECTRONICS CORP 发明人 NAMIOKA SEIGO
分类号 H01L21/8242;H01L21/28;H01L21/3205;H01L21/768;H01L23/532;H01L27/108 主分类号 H01L21/8242
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