发明名称 OXIDE SINTERED BODY, OXIDE SPUTTERING TARGET, CONDUCTIVE OXIDE THIN FILM HAVING HIGH REFRACTIVE INDEX AND METHOD FOR PRODUCING OXIDE SINTERED BODY
摘要 PROBLEM TO BE SOLVED: To provide a sintered body that can produce a conductive thin film achieving a high transmittance of visible light and a high refractive index.SOLUTION: The sintered body is composed of indium (In), titanium (Ti) or chromium (Cr), zinc (Zn) or tin (Sn), and oxygen (O), contains 2-65 mol% of In in terms of InOand 2-65 mol% of Ti or Cr in terms of TiOor CrO, respectively, and satisfies 0.5&le;A/B&le;5 and 0<C/(A+B)<10 when an atomic ratio of In (at%) is A, an atomic ratio of Ti or Cr (at%) is B and an atomic ratio of Zn or Sn (at%) is C.
申请公布号 JP2015107910(A) 申请公布日期 2015.06.11
申请号 JP20140221234 申请日期 2014.10.30
申请人 JX NIPPON MINING & METALS CORP 发明人 NARA ATSUSHI
分类号 C04B35/453;C04B35/00;C04B35/457;C23C14/34 主分类号 C04B35/453
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