MANUFACTURING METHOD OF ORGANIC LIGHT EMITTING DIODE DISPLAY DEVICE

摘要

A manufacturing method of an organic light emitting diode display device includes: forming a gate electrode on a display area of a substrate including a peripheral area; forming a gate insulating layer on the substrate; forming a semiconductor layer overlapping the gate electrode; forming source and drain electrodes on the semiconductor layer; forming a passivation layer on the source and drain electrodes, and the gate insulating layer; forming a first electrode connected to the drain electrode; forming an etching preventing layer on the gate insulating layer in the peripheral area; forming a pixel definition layer including an opening exposing the first electrode; forming a first organic layer in the opening and a second organic layer on the pixel definition layer and the etching preventing layer; removing the second organic layer on the etching prevention layer; removing the etching prevention layer; and forming a second electrode on the second organic layer.

主权项

1. A manufacturing method of an organic light emitting diode display device, comprising:
forming a gate electrode on a display area of a substrate comprising a peripheral area surrounding the display area; forming a gate insulating layer by depositing an inorganic insulating material on the gate electrode and the substrate; forming a semiconductor layer on the gate insulating layer in the display area, the semiconductor layer overlapping the gate electrode; forming source and drain electrodes on the semiconductor layer; forming a passivation layer on the source electrode, the drain electrode, and the gate insulating layer; forming a first electrode on the passivation layer and connected to the drain electrode; forming an etching preventing layer on the gate insulating layer in the peripheral area; forming a pixel definition layer on the passivation layer and the first electrode, the pixel definition layer comprising an opening exposing a portion of the first electrode; forming a first organic layer on exposed portion of the first electrode and a second organic layer on the pixel definition layer and the etching preventing layer; removing the second organic layer from the etching prevention layer; removing the etching prevention layer; and forming a second electrode on the first organic layer, the second organic layer, and the pixel definition layer.