发明名称 THIN FILM TRANSISTOR ARRAY PANEL AND METHOD OF MANUFACTURING THE SAME
摘要 An exemplary embodiment provides a thin film transistor array panel including: a substrate; a gate line; a semiconductor layer; a data wire layer; a first passivation layer; and a second passivation layer. The gate line is disposed on the substrate and includes a gate electrode. The semiconductor layer is disposed on the substrate. The data wire layer is configured to include a data line disposed on the substrate to cross the gate line, a source electrode connected to the data line, and a drain electrode disposed to face the source electrode. The first passivation layer is disposed on a channel region between the source electrode and the drain electrode. The second passivation layer is disposed on the first passivation layer, the source electrode, and the drain electrode. A width of the first passivation layer disposed on the channel region is equal to or smaller than a distance between the source electrode and the drain electrode.
申请公布号 US2015171111(A1) 申请公布日期 2015.06.18
申请号 US201414265774 申请日期 2014.04.30
申请人 Samsung Display Co., Ltd. 发明人 HONG Sun-Young
分类号 H01L27/12;H01L29/49;H01L21/467;H01L23/31;H01L29/786;H01L29/66 主分类号 H01L27/12
代理机构 代理人
主权项 1. A thin film transistor array panel comprising: a substrate; a gate line disposed on the substrate and including a gate electrode; a semiconductor layer disposed on the substrate; a data wire layer including a data line disposed on the substrate to cross the gate line, a source electrode connected to the data line, and a drain electrode disposed to face the source electrode; a first passivation layer disposed on a channel region between the source electrode and the drain electrode; and a second passivation layer disposed on the first passivation layer, the source electrode, and the drain electrode, wherein a width of the first passivation layer disposed on the channel region is equal to or smaller than a distance between the source electrode and the drain electrode.
地址 Yongin-City KR
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