| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for evaluating an optical image of a pattern that performs lithography verification in a shorter time than before.SOLUTION: The method includes obtaining data on patterns of a plurality of cells, including a specific pattern with an evaluation value of an optical image not in a first acceptable range among patterns of individual cell bodies, creating mask patterns by arranging patterns of the plurality of cells including the specific pattern, and evaluating an optical image of the specific pattern among the created mask patterns. |
