发明名称 スルーホールのめっき構造
摘要 <p>According to the present invention, an insulating substrate (1) having a through-hole (2) is injection molded. The top part of the through-hole (2) is formed into a conical space (21), and the bottom part is formed into a cylindrical space (23). The vertex angle of the cone shape is formed to 60 to 120 degrees, and the opening diameter in the top end of the through-hole (2) is formed to 10 to 100 µm. On the front and back surfaces of the insulating substrate (1) and the inside surfaces of the through-hole, electrolytic copper plating layers (32-52) are stacked respectively on electroless plating layers (31-51), forming electroconductive layers (3-6). The peripheral edge of an opening (22) in the top end of the through-hole (2) has a high electric current density because of an acute angle, and electrolytic copper plating solution easily enters and circulates from the bottom end of the through-hole; therefore, an electrolytic copper plating layer can be formed quickly on the peripheral edge of this opening, and the top end of the through-hole can be closed up in a short amount of time, making the surface flat.</p>
申请公布号 JP5753628(B2) 申请公布日期 2015.07.22
申请号 JP20140512051 申请日期 2012.04.24
申请人 发明人
分类号 H05K1/11;H05K3/40;H05K3/42 主分类号 H05K1/11
代理机构 代理人
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