发明名称 Solid-state imaging apparatus and camera
摘要 A solid-state imaging apparatus which includes a semiconductor portion having a first face on the light incident side and a second face opposite to the first face, and an optical system arranged on the first face, comprising a first semiconductor region of a first conductivity type provided on the second face side in the semiconductor region, a photoelectric conversion portion provided in the semiconductor portion so as to surround the first semiconductor region, including a second semiconductor region of the first conductivity type, and a gate electrode arranged between the first and the second semiconductor regions on the second face, for transferring a charge generated in the photoelectric conversion portion to the first semiconductor region, wherein the optical system is configured so that a light intensity in the second semiconductor region is higher than that in the first semiconductor region.
申请公布号 US9094624(B2) 申请公布日期 2015.07.28
申请号 US201414265711 申请日期 2014.04.30
申请人 Canon Kabushiki Kaisha 发明人 Shimotsusa Mineo;Soda Takehiko
分类号 H04N5/225;H04N5/355;H01L27/146;H01L31/062 主分类号 H04N5/225
代理机构 Fitzpatrick, Cella, Harper & Scinto 代理人 Fitzpatrick, Cella, Harper & Scinto
主权项 1. A solid-state imaging apparatus which includes a semiconductor portion having a first face on the light incident side and a second face which is opposite to the first face, and an optical system arranged on the first face of the semiconductor portion, comprising: a first semiconductor region of a first conductivity type configured to be provided on the second face side in the semiconductor region; a photoelectric conversion portion configured to be provided in the semiconductor portion so as to surround the first semiconductor region, and include a second semiconductor region of the first conductivity type; and a gate electrode configured to be arranged between the first semiconductor region and the second semiconductor region on the second face of the semiconductor portion, and transfer a charge generated in the photoelectric conversion portion to the first semiconductor region, wherein the optical system is configured so as to make a light intensity in the second semiconductor region higher than that in the first semiconductor region.
地址 Tokyo JP