发明名称 MEMS ELEMENT AND METHOD FOR MANUFACTURING THE SAME
摘要 <p>PROBLEM TO BE SOLVED: To provide a MEMS element which suppresses the generation of gas from an inner wall in a space in which a MEMS part is positioned.SOLUTION: A MEMS element includes a MEMS part 15 positioned in a space 61 covered by silicon nitride films 14, 36 and a silicon film 18. The MEMS part is arranged on the silicon nitride film. The silicon film is arranged above the MEMS part and adhered on the silicon nitride film positioned around the MEMS part. The silicon film has release holes 25, 26. The first hole is filled with a metal film 71. The metal film, the silicon nitride films, and the silicon film form an airtight structure.</p>
申请公布号 JP2015145037(A) 申请公布日期 2015.08.13
申请号 JP20140018257 申请日期 2014.02.03
申请人 SEIKO EPSON CORP 发明人 EBINA AKIHIKO
分类号 B81B7/02;B81C1/00;H03H3/007;H03H9/24 主分类号 B81B7/02
代理机构 代理人
主权项
地址