发明名称 PHOTOPOLYMERIZABLE COMPOSITIONS FOR ELECTROLESS PLATING METHODS
摘要 A photopolymerizable composition has seven essential components: (a) a photopolymerizable epoxy material, (b) a photoacid generator such as an onium salt, (c) electron acceptor photosensitizer, (d) an electron donor co-initiator having an oxidation potential of 0.1 V to 3 V vs. SCE, (e) metal particles, and in some embodiments, (f) one or more free radically polymerizable compounds, and (g) one or more free radical photoinitiators. This photopolymerizable composition can be applied or printed onto one or both sides of various substrates to form articles that can be used to form electrically conductive materials. Methods for using the photopolymerizable compositions include electroless plating methods that can be carried out in roll-to-roll printing and plating systems once various photocured patterns are formed from the photopolymerizable compositions.
申请公布号 US2015227041(A1) 申请公布日期 2015.08.13
申请号 US201414174879 申请日期 2014.02.07
申请人 Shukla Deepak;Mis Mark R. 发明人 Shukla Deepak;Mis Mark R.
分类号 G03F7/038 主分类号 G03F7/038
代理机构 代理人
主权项 1. A photopolymerizable composition comprising: (a) a photopolymerizable epoxy material, (b) a photoacid generator, (c) electron acceptor photosensitizes, (d) an electron donor co-initiator having an oxidation potential of 0.1 V to 3 V vs. SCE, and (e) metal particles.
地址 Webster NY US