发明名称 SEMICONDUCTOR EPITAXIAL WAFER AND SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor epitaxial wafer having a buffer layer capable of surely performing lattice matching with a channel layer while securing high insulation properties. ! SOLUTION: Disclosed is a semiconductor epitaxial wafer 1 formed by laminating a buffer layer 3 and a channel layer 4 on a substrate 2. The buffer layer 3 includes: an insulating layer 3a provided facing the substrate 2 formed using AIN as the main component; and a lattice matching layer 3b provided facing the channel 4 formed using InxAl1-xN as the main component. ! COPYRIGHT: (C)2015,JPO&INPIT
申请公布号 JP2015159207(A) 申请公布日期 2015.09.03
申请号 JP20140033626 申请日期 2014.02.25
申请人 SCIOCS CO LTD 发明人 TANAKA TAKESHI
分类号 H01L21/205;C23C16/30;C23C16/34;H01L21/338;H01L29/778;H01L29/812 主分类号 H01L21/205
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