| 摘要 |
<p>The structure (100) has a cavity (106) delimited by substrates (102, 108), where the substrates are attached by getter material portions (110, 112). One of the getter material portion forms a part of the adhesion interface and gaseous absorption and/or adsorption getter within the cavity. Portions of the substrates are made of oxide, nitride and/or glass. The thermal activation temperature of the getter material portion is less than that of another getter material portion. An independent claim is also included for a method for forming a cavity structure.</p> |
