发明名称 |
Chemical surface treatment apparatus and process |
摘要 |
An apparatus and process for chemically treating a surface of a workpiece with a liquid solution that produces an environmentally harmful gaseous byproduct includes a water spray system for contacting and reacting the gaseous byproduct at the location where it is produced during the chemical treating process. The reacted byproduct is then carried away in the water stream and with the chemical treating solution for safe disposal and recovery. Residual unreacted gaseous byproduct is chemically treated at a separate location within the same apparatus layout used to process the workpiece.
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申请公布号 |
US5030320(A) |
申请公布日期 |
1991.07.09 |
申请号 |
US19900542095 |
申请日期 |
1990.06.22 |
申请人 |
YAMAHA HATSUDOKI KABUSHIKI KAISHA |
发明人 |
NISHIMURA, KAZUYUKI;MURASE, YASUYUKI;IKEGAYA, HIROHIKO |
分类号 |
C25D5/34;B01D53/56;C23F1/08;C23G3/00;C25D17/00 |
主分类号 |
C25D5/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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