发明名称 RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
摘要 PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition excellent in LWR (line width roughness) performance and defect inhibiting property.SOLUTION: The radiation-sensitive resin composition comprises: a polymer having a first structural unit that is derived from at least one compound selected from the group consisting of a N-substituted maleimide and a fumaric diester and that includes an acid dissociable group, and a second structural unit that contains no acid dissociable group; and a radiation-sensitive acid generator. The polymer is preferably an alternating copolymer. The second structural unit is preferably derived from at least one compound selected from the group consisting of a substituted or unsubstituted norbornene and a substituted or unsubstituted tetracyclododecene. The polymer preferably does not substantially contain an aromatic ring.
申请公布号 JP2015184458(A) 申请公布日期 2015.10.22
申请号 JP20140060475 申请日期 2014.03.24
申请人 JSR CORP 发明人 OSAKI HITOMI
分类号 G03F7/039;C08F222/40;G03F7/038;H01L21/027 主分类号 G03F7/039
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