| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which allows an operator to grasp time for replacement of a liquid raw material tank by monitoring usage of a liquid raw material in the liquid raw material tank.SOLUTION: A substrate processing apparatus comprises an operation part having a display part and a storage part. The display part displays a gas pattern which has icons respectively representing a processing chamber for storing a substrate, a liquid tank for accumulating a liquid raw material, a gas supply system at least including a flow rate controller for controlling a flow rate of the liquid raw material, and an exhaust system for exhausting ambient air in the processing chamber. The storage part stores at least a parameter table for setting relevance of the liquid tank and the flow rate controller. The operation part converts an integrated value obtained by integrating flow rates detected by the flow rate controller to usage of the liquid raw material in the liquid tank depending on a conversion rate set in the parameter table.</p> |
