| 摘要 |
A chamber device is used with at least one laser beam generating device and may include a chamber that is provided with at least one incident port for introducing at least one laser beam, which is emitted from the at least one laser beam generating device, to an inside thereof, a target supply unit that is provided to the chamber and supplies a target material to a predetermined region in the chamber, a laser focusing optical system configured to focus the at least one laser beam in the predetermined region, and an optical element configured to correct light intensity distribution of a beam section, in the predetermined region, of the at least one laser beam. |
